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PCS-ECR-HN

Microwave Plasma Cracker Source for the Hybrid Generation of Atoms and Ions from Nitrogen or Reduced Nitrogen Gases

The microwave hybrid plasma source for nitrogen or reduced nitrogen gases PCS-ECR-HN is a fully UHV compatible component for most demanding MBE applications and surface modifications, suitable for a wide range of vacuum levels (UHV to HV). Microwaves with a frequency of 2.45 GHz are generated by a microwave magnetron and coupled into the plasma chamber, where a plasma is excited and the microwaves absorbed. The plasma density is enhanced by the magnetron cyclotron resonance effect, provided by a 86 mT magnetic quadrupole arranged around the plasma chamber. The electrons undergo electron cyclotron resonance (ECR) motion, which greatly enhances the electron path length and therefore the probability of collision with other molecules and subsequent ionisation.This hybrid source combines atom source and ion source characteristics to produce a source, which behaves like the atom source until potentials are applied to the extraction grids, when nitrogen ions with controllable energy (50 - 1500 eV) are then added to the beam.

The source is fully bakeable with outstanding cooling from a full length water-jacket. With additional sets of the user-exchangeable extraction grids or aperture plates, the source can be easily reconfigured for reducing gases or as an atom source, downstream plasma source or hybrid source.

KEY FEATURES

  • Filamentless design permits operation with reactive gases
  • No microwave tuning required
  • Unique integrated shutter and current monitor option
  • Trivial bakeout preparation ~1 minute
  • Integral water cooling jacket

MADE FOR THESE METHODS

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SPECIFICATIONS

PCS-ECR-HN
Operation
Working Principle

Microwave assisted plasma source

Max. Power

250 W max. at 2.45 GHz

Gas Flow Rate

< 0.1 sccm to 100 sccm (mode dependant)

Operating Modes

Hybrid mode

Operating Pressure

< 10-7 - 10-5 mbar

Optional Accessories

  • Integrated shutter
  • Non standard lengths
  • Various aperture types
  • Differential pumping
  • Faraday cup: Provides the possibility to monitor the beam current
  • Ion trap: Deflects residual ion current out of the beam<
  • Mounting
    Mounting Flange

    NW63CF (4.5 ")

    Insertion Depth

    300 mm

    Performance
    Spot Size

    ~25 mm at source

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