First Integration of KREIOS 150 MM 2D-CMOS Momentum Microscope with HESTIA ULT 6 Sample Stage Into the FlexMM Vacuum System.
The KREIOS 150 MM is a new generation of momentum microscopes for highest performance in the surface analysis field. This new analyzer type pushes the limits of small spot ARPES and surface characterization. It combines an ultimate lateral (<40 nm) and momentum resolution (<0.01 Å-1) microscopy zoom lens with a hemispheric energy filter (150 mm mean radius) for best energy resolution (<15 meV / <5meV) and a zoom lens in front of the detector allowing for on-the-fly switching between energy filtered microscopy mode (either x/y or kx/ky) and spectroscopy mode (E/kx). The PEEM lens allows collecting the full half sphere of photoelectrons emitted from the sample, giving ±90° acceptance angle or up to ± 3.6 Å-1. A single spot shifting concept in combination with apertures allows refining the reciprocal space for contrast or for selection of local spots down to < 2 μm size for small spot ARPES measurements. The KREIOS 150 MM 2D-CMOS is a momentum microscope, equipped with a 2D-CMOS detector for ultimate resolution at highest dynamic range (> 106 cps)
HESTIA ULT 6 is an ultra-low temperature piezo sample stage allowing for 6 axes of movement at ultimate vibration stability. The temperatures, that can be reached on the sample surface, are below 10K.
The stage allows for easy sample exchange using the proven SPECS SH2/12 sample holders.
The FlexMM system is equipped with an efficient pumping system for best pressures, damper legs for vibration-free operation and a taylor made µ-metal chamber. Besides the Momentum Microscope (KREIOS 150, KREIOS 150 MM or METIS 1000) and the HESTIA stage several components can be mounted, like high-flux small spot UV light sources, X-ray monochromator sources and many more. The sample transfer concept follows the FlexMOD concept, so that it can be easily integrated with all other systems of this series, like FlexPS for XPS, FlexPM for SPM and FlexPrep for sample preparation and thin film deposition. This new system type changes the way you can do ARPES in a fundamental way.