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UVS 300 NAP

Duoplasmatron Discharge Light Source with ETC Capillary for Near Ambinet Pressure Applications

The UVS 300 NAP is a real and unique duoplasmatron type discharge UV light source for near ambient pressure applications. The discharge spot is confined to a small area, which makes this source the only available point source on the market. The ETC capillary is optimal for illuminating small areas on the surface for UPS measurements. The UVS 300 NAP comes with differential pumping sytemand a special Al window for operation under NAP conditions and has excellent He II/He I ratio.

KEY FEATURES

  • High plasma density and high photon flux > 1 E16 photons/(sec x sterad)
  • FWHM < 2 meV
  • Excellent He II/He I ratio
  • With ETC focussing capillary for spot sizes smaller than 500 µm
  • Easy filament replacement through micro valve
  • Special Al window for operation under NAP conditions
  • Port aligner with z-shift for precise adjustment
  • Differential pumping

MADE FOR THESE METHODS

1
NAP-XPS and NAP-UPS
X-ray Photoelectron Spectroscopy (XPS) and Ultraviolet Photoelectron Spectroscopy (UPS) are well-established and versatile techniques commonly used...

APPLICATION NOTES

Small Spot UV Source
Small Spot UV Source
High resolution photoemission measurements demand not only a highest performance electron spectrometer, but also a UV source with high flux density and small spot size, especially for angular resolved studies. SPECS has developed a focused UV source on the basis of the proven technology of the UVS 300 source. Using a special capillary, this source can be focused down to a theoretical spot size of 500 micrometers.
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DOWNLOADS

1
UVS 300
Manuals
UVS 300 High Intensity VUV Lamp
Very high intensity gas discharge lamp producing VUV radiation suitable for UPS experiments.
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