UVS 300 NAP

Duoplasmatron Discharge Light Source with ETC Capillary for Near Ambinet Pressure Applications

The UVS 300 NAP is a real and unique duoplasmatron type discharge UV light source for near ambient pressure applications. The discharge spot is confined to a small area, which makes this source the only available point source on the market. The ETC capillary is optimal for illuminating small areas on the surface for UPS measurements. The UVS 300 NAP comes with differential pumping sytemand a special Al window for operation under NAP conditions and has excellent He II/He I ratio.

KEY FEATURES

  • High plasma density and high photon flux > 1 E16 photons/(sec x sterad)
  • FWHM < 2 meV
  • Excellent He II/He I ratio
  • With ETC focussing capillary for spot sizes smaller than 500 µm
  • Easy filament replacement through micro valve
  • Special Al window for operation under NAP conditions
  • Port aligner with z-shift for precise adjustment
  • Differential pumping
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MADE FOR THESE METHODS

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APPLICATION NOTES