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Synchrotron ARPES System with PHOIBOS Analyzer

SPECS ARPES System for Synchrotron Application

The SPECS ARPES system for synchrotrons is a fully equipped ARPES and XPS system for modern surface analysis. It features the latest PHOIBOS analyzer series in combination with a ultra low temperature manipulator, sophisticated sample handling and an additional small spot UV and monochromated X-ray source. The analysis module is based on a special µ-metal chamber optimized for low kinetic energy analysis. A dedicated surface science preparation module with all necessary techniques (surface cleaning, LEED, deposition, sample storage) is included as well as a fast entry loadlock.


  • PHOIBOS ARPES Analyzer
  • Energy Resolution <1.8 meV
  • Angular Resolution <0.1°
  • Dedicated Beamnline Entrance
  • Small Spot UV and X-Ray Source with High Intensity
  • Low Temperature 5 Axes Manipulator
  • Sample Strorage and Transfer Chamber
  • Pressure in Analysis Chamber <2 x 10-10 mbar
  • Sample Preparation Module




  1. (2023) High-energy photoemission final states beyond the free-electron approximation

    Three-dimensional (3D) electronic band structure is fundamental for understanding a vast diversity of physical phenomena in solid-state systems, including topological phases, interlayer interactions in van der Waals materials, dimensionality-driven phase transitions, etc.  Interpretation of ARPES data in terms of 3D electron dispersions is commonly based on the free-electron approximation for the  photoemissionfinal states. Our soft-X-ray ARPES data on Ag metal reveals, however, that even at high excitation energies thefinal states can be a way more complex, incorporating several Bloch waves withdifferent out-of-plane momenta. Such multibandfinal states manifest themselves as a complex structure and added broadening of the spectral peaksfrom 3D electron states. We analyse the origins of this phenomenon, and trace
    it to other materials such as Si and GaN. Ourfindings are essential for accurate determination of the 3D band structure over a wide range of materials andexcitation energies in the ARPES experiment.

    V. N. Strocov, L. L. Lev, F. Alarab, P. Constantinou, X. Wang, T. Schmitt, T. J. Z. Stock, L. Nicolaï, J. Očenášek, J. Minár
    Nature Communications, Volume 14, Article number: 4827 (2023)
    Read more
  2. (2023) Soft x-ray photoelectron momentum microscope for multimodal valence band stereography

    The photoelectron momentum microscope (PMM) in operation at BL6U, an undulator-based soft x-ray beamline at the UVSOR Synchrotron
    Facility, offers a new approach forμm-scale momentum-resolved photoelectron spectroscopy (MRPES). A key feature of the PMM is that it
    can very effectively reduce radiation-induced damage by directly projecting a single photoelectron constant energy contour in reciprocal
    space with a radius of a few Å1or real space with a radius of a few 100μm onto a two-dimensional detector. This approach was applied to
    three-dimensional valence band structureE(k)andE(r)measurements (“stereography”) as functions of photon energy(hν), its polarization
    (e), detection position(r), and temperature(T). In this study, we described some examples of possible measurement techniques using a soft
    x-ray PMM. We successfully applied this stereography technique toμm-scale MRPES to selectively visualize the single-domain band structure
    of twinned face-centered-cubic Ir thin films grown on Al2O3(0001) substrates. The photon energy dependence of the photoelectron intensity
    on the Au(111) surface state was measured in detail within the bulk Fermi surface. By changing the temperature of 1T-TaS2, we clarified
    the variations in the valence band dispersion associated with chiral charge-density-wave phase transitions. Finally, PMMs for valence band
    stereography with various electron analyzers were compared, and the advantages of each were discussed.

    Fumihiko Matsui, Kenta Hagiwara, Eiken Nakamura, Takayuki Yano, Hiroyuki Matsuda,
    Yasuaki Okano, Satoshi Kera, Eri Hashimoto, Shinji Koh, Keiji Ueno, Takahiro Kobayashi,
    Emi Iwamoto, Kazuyuki Sakamoto, Shin-ichiro Tanaka, and Shigemasa Suga
    Rev. Sci. Instrum. 94, 083701 (2023)
    Read more
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