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PCS-RF-HO

Radio Frequency Plasma Cracker Source for the Hybrid Generation of Atoms and Ions from Oxygen or Reduced Oxygen Gases.

The ion plasma source for nitrogen or other reduced nitrogen gases PCS-ECR-HN is a fully UHV compatible component for most demanding MBE applications and surface modifications, suitable for a wide range of vacuum levels (UHV to HV). A RF current with 13.56 MHz is generated by the RF power supply and fed into a RF coil that surrounds the plasma tube in the source. The corresponding RF field is inductively coupled into the plasma tube and plasma is generated from the gas molecules inside the plasma discharge tube. High RF powers lead to very high power density in the plasma and thus highest possible cracking efficiencies. This hybrid source combines atom source and ion source characteristics to produce a source, which behaves like the atom source until potentials are applied to the extraction grids, when oxygen ions with controllable energy (50 - 1500 eV) are then added to the beam.

The source is fully bakeable with outstanding cooling from a full length water-jacket. With additional sets of the user-exchangeable extraction grids or aperture plates, the source can be easily reconfigured for reducing gases or as an atom source, downstream plasma source or hybrid source.

KEY FEATURES

  • Filamentless design permits operation with reactive gases
  • Unique coaxial design: For easy mounting on virtually all vacuum systems
  • Unique integrated shutter and current monitor option
  • Integral water cooling jacket for minimum system heat load
  • Continously tunable from very small to very high atom fluxes

SPECIFICATIONS

PCS-RF-HO
Operation
Working Principle

Radio Frequency assisted plasma source

Max. Power

500 W max. at 13.56 MHz

Gas Flow Rate

< 0.1 sccm to 100 sccm (mode dependant)

Opteration Modes

Hybrid mode

Operating Pressure

< 10-7 - 10-5 mbar

Optional Accessories

  • Integrated shutter
  • Non standard lengths
  • Various aperture types
  • Differential pumping
  • Autotuning unit
  • Viewport
  • Plasma monitor
  • Plasma controller
  • Faraday cup: For monitoring the b
  • Mounting
    Insertion Depth

    300 mm

    Mounting Flange

    NW63CF (4.5 ")

    Performance
    Spot Size

    23 mm at source

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