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Mini Microwave  Ion Plasma Cracker Source for Nitrogen or other Reducing Gases for Most Demanding MBE Applications in Small Vacuum Chambers.

The mini microwave ion plasma source for nitrogen or other reducing gases MPS-ECR-IN is a fully UHV compatible component for most demanding MBE applications and surface modifications, suitable for a wide range of vacuum levels (UHV to HV) in small vacuum chambers. Microwaves with a frequency of 2.45 GHz are generated by a microwave magnetron and coupled into the plasma chamber, where a plasma is excited and the microwaves absorbed. The plasma density is enhanced by the magnetron cyclotron resonance effect, provided by a 86 mT magnetic quadrupole arranged around the plasma chamber. The electrons undergo electron cyclotron resonance (ECR) motion, which greatly enhances the electron path length and therefore the probability of collision with other molecules and subsequent ionisation.The charged particles are actively extracted from the plasma and accelerated towards the sample by application of an accelerating voltage. To avoid recombination of the ions and electrons, the source is equipped with metallic grids that have larger holes than the apertures in atom mode. The kinetic energy of the extracted ions is considerably higher than that of the neutral particles in atom mode, which allows implantation into deeper layers of the sample or sputtering of surface layers. 

The source is fully bakeable, with an all-welded stainless steel vacuum envelope, and outstanding cooling from a full length water-jacket.With additional sets of the user-exchangeable apertures and extraction grids, the source can be easily reconfigured for oxidizing gases, as a downstram plasma source or as a dedicated atom or ion source.The small mounting flange (DN40CF) makes the source suitable where space constraints are an issue.


  • Filamentless design permits operation with reactive gases
  • Unique integrated shutter and current monitor option
  • Trivial bakeout preparation ~1 minute Integral water cooling jacket
  • Small mounting flange




Working Principle

Microwave assisted plasma source

E-beam power

60 W max. at 2.45 GHz

Gas Flow Rate

< 0.1 sccm to 100 sccm (mode dependant)

Operating Modes

Ion mode

Operating Pressure

< 10-7 - 10-5 mbar

Optional Accessories
  • Integrated shutter
  • Non standard lengths
  • Various aperture types
  • Differential pumping
  • Ion trap: Deflects residual ion current o
  • Faraday cup: Provides the possibility to monitor the beam current
Spot Size

~13 mm at source

Mounting Flange

NW40CF (2.75 ")

Insertion Depth

130 mm


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