Deposition Sources
Electron beam (e-beam) evaporation is a physical vapor deposition technique used to create thin films of materials by heating them with a focused electron beam. This method allows for the deposition of high-purity films, including metals and semiconductors, in ultra-high vacuum conditions. It is widely applied in surface science, materials research, and nanotechnology for producing coatings, electronic components, and optical devices. The precise control over deposition rates and material purity makes it ideal for applications requiring high-quality thin films, such as in microelectronics and photonics.
Ultraviolet Sources
Photoelectron spectroscopy (PES) is one of the most powerful and most frequently used spectroscopic techniques in solid state physics, physical chemistry and materials science. Using the photoelectric effect, PES provides a material sensitive and non-destructive probe for modern scientists to examine the chemical composition (XPS or ESCA) and the electronic structure (UPS and ARPES) of matter.
Focus offers a series of small spot UV sources fitted to various demands, starting from flexible and robust UV sources for economic application to highly sophisticated UV sources for different gases and photon energies with monochromators for highest performance and energy resolution.
Ion Sources
Ion Sputter sources are a basic pre-requisite for sample preparation in surface science. The Focus FDG 150 and FDG 15 hot filament are premium componente to please the requests for ultra clean smaple preparation of metals and semiconductors. Standard operating gas is Ar but other noble gases and hydrogen or oxygen work as well. Both sources can be differentially pumped and the FDG 150 in addition offers a finely focused ion beam (150μm @ 50 mm working distance) with scanning option and optional regulated gas-inlet for classical XPS depth profiling.