FDG 150
Fine Focus Scanning Ion Source
The FDG hot filament ion source is ideally suited for cleaning metals and semiconductors, performing XPS Depth Profiling and ISS/LEIS experiments or as a < 15 eV charge neutralization source. All variants operate as standard with Argon gas but other noble gases or reactive gases like Hydrogen or Oxygen are also fully compatible. FDG ion sources are made of completely non-magnetic materials and are compatible with high-resolution electron spectroscopy. An ultra clean ion beam is ensured by an indirect filament, a direct gas inlet for minimizing dead volume and effective differential pumping.
The power supply can be fully remote controlled and an easy to use software is provided.
SPECIFICATIONS
| Ion Current | >15 µA (at 5 keV and 50 mm WD) >1 µA (at 50 eV) |
| Ion Energy | 10 eV - 5 keV |
| Operating Gases | Argon and other noble gases, Hydrogen and Oxygen |
| Scannable | yes |
| Working Principle | Extractor type with floating column |
| Applications |
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| Required Accessories | Gas inlet |
| Optional Accessories | Differential pumping |
| Scan Range | up 10 mm x 10 mm (at 5 keV and 50 mm WD) |
| Spot Size | <150 µm (at 5 keV and 50 mm WD) |
| Insertion Depth | 224 mm |
| Mounting Flange | DN 40 CF |