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FDG 15

Variable Focus Ion Source

The FDG 15 ion source is designed to sputter clean samples for surface analysis with spot size varying from 300 μm to 50 mm or varying working distance correspondingly. FDG ion sources are made of completely non-magnetic materials and are compatible with high-resolution electron spectroscopy. An ultra clean ion beam is ensured by an indirect filament, a direct gas inlet for minimizing dead volume and effective differential pumping.
The power supply can be fully remote controlled and an easy to use software is provided.

KEY FEATURES

  • Indirect filament geometry
  • Optimized ratio of spot size vs. working distance
  • Wide kinetic energy range
  • Large scanning area
  • High stability emission current based flux regulation

MADE FOR THESE METHODS

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SPECIFICATIONS

FDG 15
Operation
Ion Current

>15 µA (at 5 keV and 50 mm WD)

>1 µA (at 50 eV)

Ion Energy

10 eV -5 keV

Operating Gases

Argon and other noble gases, Hydrogen and Oxygen

Scannable

no

Working Principle

Extractor type with floating column

Applications
  • Charge compensation
  • Wide energy range sputter cleaning of semiconductors and metals
Required Accessories

Gas inlet

Optional Accessories

Differential pumping

Performance
Scan Range

-

Spot Size

<300 µm (at 5 keV and 50 mm WD)

Mounting
Insertion Depth

173 mm

Mounting Flange

DN 40 CF

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