EnviroMETROS FAB
The novel EnviroMETROS FAB series provides the perfect routine analysis tools for any sample with a special focus on multilayer thin films and their surfaces by combining small to large sample capabilities or wafer handling with a variable information depth photoelectron spectrometer.
EnviroMETROS FAB addresses new challenges, enabling non-destructive depth profiling of ultra-thin films and multilayer stacks. This preserves the original sample while providing reliable depth information for semiconductor research, process development and quality control.
Model Comparison
The EnviroMETROS FAB is equipped with a monochromatic four energy line X-ray source enabling fast acquisition of high-quality spectra from welldefined analysis areas. The LAB configuration is also compatible with Near-Ambient Pressure (NAP) measurements.
X-ray source
- Up to 4 switchable X-ray excitation lines (Al Kα, Ag Lα, Ti Kα, Cr Kα)
- Spot sizes: Al Kα and Ag Lα: < 100 μm to 500 μm;
Ti Kα: < 150 μm to 500 μm;
Cr Kα: < 200 μm to 500 μm
Pressure
- UHV (< 5 × 10-10 mbar)
- Upgradable to NAP conditions (up to 50 mbar)
The EnviroMETROS μFAB is equipped with a monochromatic multi-color X-ray source with a scannable small spot size. This level of spatial resolution enables chemical-state mapping and small-area analysis on heterogeneous samples, microstructured devices, and individual features.
X-ray source
- Up to 3 switchable X-ray excitation lines (Al Kα, Ag Lα or Ti Kα, Cr Kα)
- Spot sizes: Al Kα and Ag Lα: < 10 μm to 300 μm;
Ti Kα and Cr Kα: < 25 μm to 300 μm - Scannable: 2 × 2 mm
Pressure
- UHV (< 5 × 10-10 mbar)
