Advanced, fully automated X-ray photoelectron spectroscopy (XPS) system
EnviroMETROS LAB is the new XPS instrument made for advanced measurements from surface to interface
Combining fully automated XPS, HAXPES and PARXPS with up to four X-ray excitation lines, EnviroMETROS LAB enables surface-sensitive analysis, non-destructive depth profiling and characterization of buried interfaces. Optional near-ambient-pressure operation and complementary techniques extend the system from routine XPS analysis to multimodal research.
Core Techniques
X-ray Photoelectron Spectroscopy (XPS)
XPS uses focused X-rays to determine the elemental composition, chemical states and bonding environments of the uppermost 1 to 10 nm of a material. The μFOCUS four-line X-ray source and AEOLOS 150 AD-CMOS analyzer enable measurements with Al Kα, Ag Lα, Ti Kα and Cr Kα excitation, providing variable information depths for surface and interface analysis.
Hard X-ray Photoelectron Spectroscopy (HAXPES)
Higher-energy Ag Lα, Ti Kα and Cr Kα excitation increases the information depth to approximately 20 to 30 nm, enabling non-destructive analysis of capped layers and buried interfaces. The high photon flux of Ti Kα supports faster acquisition, making laboratory HAXPES suitable for routine depth-resolved analysis.
Parallel Angle-Resolved X-ray Photoelectron Spectroscopy (PARXPS)
PARXPS records photoelectrons across a wide 60° angular range in parallel. Different emission angles provide information from different depths, enabling non-destructive analysis of composition and chemical states within ultra-thin layers. It is particularly suited to layered structures, oxide growth, surface segregation and functional coatings.