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FOCUS EFM 4

The EFM 4 provides the same features as the EFM 3 but is intended for the deposition on substrates with a larger diameter up to about 50 mm.

The EFM 4 provides the same features as the EFM 3 but is intended for the deposition on substrates with a larger diameter up to about 50 mm.

The three different exit apertures allow to adapt the evaporation area exactly to the size of the sample. Evaporation rates varying from 1/10 monolayer per minute to over 1000 monolayers per second can be achieved by selection of the appropriate crucible and e-beam power.
 

The EFM 4 is suitable for crucible capacities up to 700 mm3.

The effective water-cooling ensures low background pressure (typically in the 10-10 mbar range) even during prolonged operation at high evaporant temperatures.

Due to the larger evaporation areas being targeted the operation of the EFM 4 with the EVC 300 power supply is the most suitable configuration.

KEY FEATURES

  • Evaporation area Ø 10 – 133 mm
  • Flux monitor
  • Integrated shutter
  • Crucible capacity up to about 700 mm3
  • Mounting flange NW 35 CF
  • All other features same as EFM 3

MADE FOR THESE METHODS

1

SPECIFICATIONS

FOCUS EFM 4
Operation
Number of Pockets

1

Water Cooling

internal

E-beam power

300 W

Operating Pressure

< 10-10 - 10-5 mbar

Optional Accessories

Non standard lengths 

Mounting
Mounting Flange

NW35CF (2.75 ")

Insertion Depth

210 mm

Max. Rod Feed

25 mm

Power Supply

300 W

Shutter

Motorized shutter

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