FOCUS EFM 3s

This device is a product of FOCUS GmbH. Further details can be found here: FOCUS EFM 3s

As the very first family member the EFM 3 is designed for thin film growth and molecular beam epitaxy. Sub-monolayer and multilayer systems can be produced with evaporation rates varying from 1/10 monolayer per minute to several monolayers per second. The EFM 3s adds an additional electrode to the EFM 3. A part of the evaporant beam in all products of the EFM-series is ionized by the electron bombardment during heating. Most of these ions are captured by the flux monitor electrode.

The precisely defined evaporant beam profile allows highly uniform deposition on the sample. The deposition area is determined by the choice of three different easily exchangeable exit apertures and the distance from the source to the sample. Integral part of the EFM 3 is a z-shift for material feed when using rods or simply to optimize the distance between the electron beam filament and material to be evaporated either from a rod or crucible.

As the evaporant is on high voltage with respect to the grounded sample the remaining ions may create defects in the substrate surface and deposit energy.

To generate a 100 % neutral beam an additional voltage is applied at the suppressor electrode of the EFM 3s.

The integrated flux-monitor and the shutter allow for a precise reproducibility of previously applied evaporation rates before the sample is exposed to the evaporant (even with shutter speed closed).

Upgrade packages for existing EFM 3 are available on request. All other features of the EFM 3 are fully preserved.