DetailFOCUS EFM 3
The EFM 3 with its proprietary cooling concept has been the first commercial evaporator using an integrated flux monitor. The design has been so successful that it sets the reference for ultimate clean evaporation in UHV.
This product is product of FOCUS GmbH. Further details can be found here: FOCUS EFM 3
As the very first family member the EFM 3 is designed for thin film growth and molecular beam epitaxy. Sub-monolayer and multilayer systems can be produced with evaporation rates varying from 1/10 monolayer per minute to several monolayers per second.
The precisely defined evaporant beam profile allows highly uniform deposition on the sample (ref. to graph on parameters page).
The deposition area is determined by the choice of three different (easily exchangeable) exit apertures and the distance from the source to the sample. Integral part of the EFM 3 is a z-shift for material feed when using rods or simply to optimize the distance between the electron beam filament and material to be evaporated either from a rod or crucible.
The integrated flux-monitor in combination with a closed shutter allows for a precise reproducibility of previously applied evaporation rates prior to the sample exposing.
In combination with the EVC 300-2 / 300s-2, the flux monitor signal can be used to fully control the evaporation process by the integrated flux regulation.
The EFM 3 can be combined with all EVC power supplies: EVC 100L, EVC 100s, EVC 300-2 / 300s-2 and EVC 300i. All the above holds for the entire product range in general.
SPECIFICATIONS
| Number of Pockets | 1 |
| Water Cooling | internal |
| E-beam power | 300 W |
| Operating Pressure | < 10-10 - 10-5 mbar |
| Optional Accessories | Non standard lengths |
| Mounting Flange | NW35CF (2.75 ") |
| Insertion Depth | 210 mm |
| Max. Rod Feed | 25 mm |
| Power Supply | 300 W |
| Shutter | Motorized shutter |
