NAP-RHEED

Near Ambient  Pressure (NAP) Option for RHD-30 allows the RHEED Gun to be used in Higher Pressure (up to 1 mbar) Applications, like PLD, CVD, Magnetic Sputtering and Reaction MBE

NAP-RHEED is a NAP option for RHD-30. The RHEED gun can be equipped with one or two differential pumping stages and a RHD-NAP extension with beam tube (length can be customized) including mini-RHEED screen aperture and clamp flange holder for operation of the RHEED gun up to chamber pressures of 1 mbar for  applications, like PLD, CVD, magnetic sputtering and reaction MBE. The system consists of the RHEED gun, the power supply and a remote control for convenient adjustment of the beam parameters when viewing the RHEED screen. Factory alignment of the gun ensures that filament replacement is very straightforward with the minimum of alignment required.  Full control of the grid voltage (Wehnelt) allows electronic aperturing of the beam and independent control of spot size and intensity unlike self- or auto-bias designs. Focusing and deflection elements are external to the vacuum and hence immune to coating by materials in the vacuum which can cause instability in electrostatic focus and deflection systems. Built in beam blanking allows the beam to be turned off without disturbing the HV and filament settings for rapid recovery of the diffraction pattern when required and is often used to minimise the electron load on the sample.Such accessories as manipulator for easy adjustment of the RHEED gun, gate valve between chamber and RHEED gun for independent venting and special imaging screen set for NAP applications are available for cofortable handling.

KEY FEATURES

  • 30 kV Maximum Primary Energy 
  • High pressure operation up to 1 mbar
  • Factory Calibrated 
  • X-Y Deflection 
  • Ex-Vacuo Magnetic Lens and Deflection System 
  • Adjustable X-Y Orientation 
  • Wired Remote Control Option
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MADE FOR THESE METHODS

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SPARE PARTS

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Product description
Article No.
 
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