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IQP 10/63

Penning Discharge Type Cold Cathode Ion Source 

This product is discontinued

The IQP 10/63 is a reliable ion source with high ion current up to 50 µA, variable ion energy 0 - 6 keV, flat beam profile and large sputter area. It is suitable for reactive gases and can be supplied with a complete gas inlet system.

KEY FEATURES

  • Penning type cold cathode
  • High ion current
  • Flat beam profile
  • Large sputter area
  • Suitable for reactive gases


     

MADE FOR THESE METHODS

2
Sputter Depth Profiling
Film Thicknesses of multilayer samples and the depth distribution of elements can be characterized by sputter depth profiling.
Surface Preparation
In order to obtain relevant results by cutting edge characterization methods it requires preparation and deposition of well-defined, clean surfaces

SPECIFICATIONS

IQP 10/63
Performance
Ion Energy

2 - 6 keV

Ion Current

20 µA at 3 kV beam energy

Spot Size

4 - 20 mm (homogeneity of profile: 5 % withing 60 % of beam width) 

Beam current density

max. 150 µA/cm-2

Operation
Working Distance

30 - 500 mm

Operating Gases

noble gasses, O2, N2

SPARE PARTS

2
Product image
Product description
Article No.
 
Set of cathodes for IQP 10/63

Set of cathodes for IQP 10/63

2010867027
Support ceramic for IQP 10/63

Replacement ceramic for IQP 10/63

2003560126

DOWNLOADS

2
IQP 10/63
Manuals
IQP 10/63 Ion Source
Cold cathode ion source suitable for sample cleaning and preparation. To be used with IQP 10-A power supply.
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IQP 10-A
Manuals
IQP 10-A Ion Source Power Supply
Power supply for controlling the IQP 10/63 cold cathode ion source.
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