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PHOIBOS 150 NAP 2D-DLD
Operation
Energy Dispersion

Hemisphere

Slits/Apertures

8 Entrance, 3 Exit slits and Iris aperture

Magnetic Shielding

Double µ-Metal Shielding

Lens Modes

Angular Resolving, Transmission and Magnification (Lateral Resolution) Lens Modes

Kinetic Energy Range

0 - 3500 eV

Pass Energies

0 - 550 eV continously adjustable

Detector

2D-DLD Detector

Measurement Modes

Snapshot mode, Sweeping mode, Fixed energy mode

Energy Window

13% of Pass Energy

Electric Isolation

up to 7 keV

Electronics

HSA 3500 plus HT 101 for analyzer and HSA 3500 plus HT 173 for pre-lens

Working Pressure

up to 30 mbar (higher pressure values achievable with corresponding nozzle diameters and differential pumping packages)

Mounting
Mounting Flange

DN150 CF (8" OD)

Working Distance

300 - 500 µm (for standard nozzle with 300 µm diameter)

Performance
Acceptance Angle

±22°

Angular Resolution

< 0.7°

Energy Resolution

< 10 meV

Lateral Resolution

<15 μm (guaranteed), <10 μm (achievable) with imaging lens module

Smallest Acceptance Spot

Without imaging lens module the smallest acceptance spot is defined by the excitation spot of X-ray source or nozzle diameter

Detector Channels

800 x 640 (with channel binning)

XPS Count Rates UHV

70 kcps (guaranteed), 150 kcps (achievable) *

XPS Count Rates 10 mbar

7 kcps (guaranteed), 15 kcps (achievable) *

XPS Count Rates 25 mbar

0.5 kcps (guaranteed), 1.5 kcps (achievable) *

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* Ag 3d, FWHM < 0.85 eV, small spot monochromated X-ray source µ-FOCUS 600, Al Kα anode, 20 W, Spot size < 250 µm

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