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PHOIBOS 150 HV NAP 2D-CCD/CMOS
Operation
Energy Dispersion

Hemisphere

Slits/Apertures

8 Entrance, 3 Exit slits and Iris aperture

Magnetic Shielding

Double µ-Metal Shielding

Lens Modes

Angular Resolving, Transmission and Magnification (Lateral Resolution) Lens Modes

Kinetic Energy Range

0 - 7000 eV

Pass Energies

0 - 550 eV continously adjustable

Detector

2D-CCD/CMOS Detector

Measurement Modes

Snapshot mode, Sweeping mode, Fixed energy mode

Energy Window

13% of Pass Energy

Electric Isolation

up to 7 keV

Electronics

HSA 7000 plus

Working Pressure

up to 30 mbar (higher pressure values achievable with corresponding nozzle diameters and differential pumping packages)

Mounting
Mounting Flange

DN150 CF (8" OD)

Working Distance

300 - 500 µm (for standard nozzle with 300 µm diameter)

Performance
Acceptance Angle

±22°

Angular Resolution

< 0.7°

Energy Resolution

< 20 meV

Lateral Resolution

<20 μm (guaranteed) and <15 μm (achievable) with imaging lens module

Smallest Acceptance Spot

Without imaging lens module the smallest acceptance spot is defined by the excitation spot of X-ray source or nozzle diameter

Detector Channels

1900 x 1200 (with channel binning)

XPS Count Rates UHV

70 kcps (guaranteed), 150 kcps (achievable) *

XPS Count Rates 10 mbar

7 kcps (guaranteed), 15 kcps (achievable) *

XPS Count Rates 25 mbar

0.5 kcps (guaranteed), 1.5 kcps (achievable) *

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* Ag 3d, FWHM < 0.85 eV, small spot monochromated X-ray source µ-FOCUS 600, Al Kα anode, 20 W, Spot size < 250 µm

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